R & D MAGNETRON SPUTTERING SOURCES (HV AND UHV)
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Stiletto Series HV Sources
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Stiletto Series Circular Sources 1"- 4"
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Stiletto Series Rectangular Sources
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End mounted - for tube coating
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Turrets and cluster flanges
A300 Series UHV Sources
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A300-XP UHV Sources 1.5"- 6"
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A310 1" UHV Sources
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CTM Series Sources
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Turrets and cluster flanges
A3CV Series UHV Sources
- Convertible target modules
- Specialty configurations
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PRODUCTION MAGNETRON SPUTTERING SOURCES (HV)
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STX & STXL Series Sources
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STX Series Circular Sources 5"-12"
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STXL Series Rectangular Sources 75mm x 300 mm to 150 mm x 1.0 m
Nautilus Rotating Magnet Sources
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Open magnet architecture flexibility for tailored uniformity optimization
Cylindrical Target Sources
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For 360° immersion coating
Triangular Target Sources
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For 200 mm wafer batch coating
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